Sub-100nm pattern generation by laser direct writing using a confinement layer

Opt Express. 2013 Apr 8;21(7):9017-23. doi: 10.1364/OE.21.009017.

Abstract

A novel technique is introduced that dramatically increases the quality and spatial resolution of directly ablated periodic nanostructures on materials. The presented method utilizes a PMMA confinement layer spin coated on the surface of the ablated material reducing the violence and speed of expansion of the molten material. As a result, droplet formation deteriorating the achievable resolution can be completely avoided. Moreover, motion control of the molten material leads to structural details with dimensions well below the irradiation wavelength.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Lasers*
  • Materials Testing
  • Molecular Imprinting / methods*
  • Nanoparticles / chemistry*
  • Nanoparticles / radiation effects*
  • Nanoparticles / ultrastructure
  • Polymethyl Methacrylate / chemistry*
  • Polymethyl Methacrylate / radiation effects*
  • Surface Properties / radiation effects

Substances

  • Polymethyl Methacrylate