Plow and ridge nanofabrication

Wooyoung Shim; Keith A Brown; Xiaozhu Zhou; Boris Rasin; Xing Liao; Abrin L Schmucker; Chad A Mirkin

doi:10.1002/smll.201203014

Plow and ridge nanofabrication

Small. 2013 Sep 23;9(18):3058-62. doi: 10.1002/smll.201203014. Epub 2013 Feb 20.

Authors

Wooyoung Shim¹, Keith A Brown, Xiaozhu Zhou, Boris Rasin, Xing Liao, Abrin L Schmucker, Chad A Mirkin

Affiliation

¹ Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, IL 60208, USA.

Abstract

Traditionally, scanning probe lithography tools are limited in resolution by the radius of curvature of the tip used. Herein, an approach is described for patterning the ridge of piled-up polymer that naturally occurs when a scanning probe is pressed against a soft surface. The use of this phenomenon to transfer patterns to hard materials with 20 nm resolution is demonstrated.

Keywords: atomic force microscopy; nanofabrication; nanolithography; polymers; scanning probe microscopy.

Publication types

Research Support, N.I.H., Extramural
Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

Microscopy, Atomic Force
Nanostructures / chemistry*
Nanotechnology / methods*

Grants and funding

U54 CA151880/CA/NCI NIH HHS/United States