Polarimetric characterization of bismuth thin films deposited by laser ablation

Appl Opt. 2012 Dec 20;51(36):8549-56. doi: 10.1364/AO.51.008549.

Abstract

A Mueller-Stokes analysis is applied to pure bismuth thin film samples prepared by the laser ablation technique by using a polarimeter with a 632.8 nm continuum wavelength laser. The complex refractive index is determined in the range of 250-1100 nm. Results from the Mueller matrix show the high sensitivity of diattenuation and polarizance parameters as a function of the sample thickness and the incidence angle, except at the pseudo-Brewster angle, where they exhibit the same value. Results show that the knowledge of the polarimetric response, with appropriate incident polarization states, could be used to design photonic Bi-based devices for several applications. Polarization dependence is the result of changes on the surface morphology as a result of the small value of the skin depth.