Tailored star block copolymer architecture for high performance chemically amplified resists

Abstract

Star block copolymers are demonstrated for their application as a high-performance resist material. This new resist material shows advanced progress in sensitivity and solubility contrast and is finally combinatorially optimized to achieve a 66 nm line/space pattern. The tailored molecular architecture of the star block copolymer is synthesized via core-first atom transfer radical polymerization (ATRP) and shows narrow polydispersity indices below 1.2.