Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template

Doyoung Kim; Jaehong Yoon; Hyungjun Kim

doi:10.1166/jnn.2012.4703

Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template

J Nanosci Nanotechnol. 2012 Feb;12(2):1483-6. doi: 10.1166/jnn.2012.4703.

Authors

Doyoung Kim¹, Jaehong Yoon, Hyungjun Kim

Affiliation

¹ School of Electrical and Electronic Engineering, Yonsei University, Seoul 120-784, Korea.

PMID: 22629984
DOI: 10.1166/jnn.2012.4703

Abstract

ZnO nanodots were prepared by selective area atomic layer deposition (SA-ALD) on an octadecyltrichlorosilane (ODTS) self-assembly monolayers (SAMs) patterns formed using a diblock co-polymer (DBC) nanotemplate. In order to transfer well-ordered nanaotemplate in SAMs, SiO2 sacrificial layer was inserted between DBC and SAMs. Cylindrical nanoholes under 16 nm diameters were well-formed on SiO2 layer. SA-ALD of ZnO was successfully performed on by ODTS SAMs.