Electrochemically induced maskless metal deposition on micropore wall

Small. 2012 May 7;8(9):1345-9. doi: 10.1002/smll.201102327. Epub 2012 Mar 2.

Abstract

By applying an external electric field across a micropore via an electrolyte, metal ions in the electrolyte can be reduced locally onto the inner wall of the micropore, which was fabricated in a silica-covered silicon membrane. This maskless metal deposition on the silica surface is a result of the pore membrane polarization in the electric field.

Publication types

  • Research Support, Non-U.S. Gov't