This report describes an ultrafast, large-area, and highly flexible method to construct complex two- and three-dimensional silicon nanostructures with deterministic non-close-packed symmetry. Pulsed excimer laser irradiation is used to induce a transient melt transformation of amorphous silicon filled in a colloidal self-assembly-directed inverse opal template, resulting in a nanostructured crystalline phase. The pattern transfer yields are high, and long-range order is maintained. This technique represents a potential route to obtain silicon nanostructures of various symmetries and associated unique properties for advanced applications such as energy storage and generation.