Photolabile protecting groups in metal-organic frameworks: preventing interpenetration and masking functional groups

Rajesh K Deshpande; Geoffrey I N Waterhouse; Geoffrey B Jameson; Shane G Telfer

doi:10.1039/c1cc12884a

Photolabile protecting groups in metal-organic frameworks: preventing interpenetration and masking functional groups

Chem Commun (Camb). 2012 Feb 1;48(10):1574-6. doi: 10.1039/c1cc12884a. Epub 2011 Jul 22.

Authors

Rajesh K Deshpande¹, Geoffrey I N Waterhouse, Geoffrey B Jameson, Shane G Telfer

Affiliation

¹ MacDiarmid Institute for Advanced Materials and Nanotechnology, Institute of Fundamental Sciences, Palmerston North, New Zealand.

PMID: 21779545
DOI: 10.1039/c1cc12884a

Abstract

Photolabile groups can be incorporated into metal-organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

Crystallography, X-Ray
Models, Molecular
Nitrobenzenes / chemistry*
Organometallic Compounds / chemical synthesis
Organometallic Compounds / chemistry*
Phenyl Ethers / chemistry*
Zinc / chemistry*

Substances

Nitrobenzenes
Organometallic Compounds
Phenyl Ethers
Zinc