A high-performing nanostructured TiO2 filter for volatile organic compounds using atomic layer deposition

Hye Jin Lee; Hyun Ook Seo; Dong Wun Kim; Kwang-Dae Kim; Yuan Luo; Dong Chan Lim; Hyungkuk Ju; Jin Won Kim; Jaeyoung Lee; Young Dok Kim

doi:10.1039/c1cc10307e

A high-performing nanostructured TiO2 filter for volatile organic compounds using atomic layer deposition

Chem Commun (Camb). 2011 May 21;47(19):5605-7. doi: 10.1039/c1cc10307e. Epub 2011 Apr 7.

Authors

Hye Jin Lee¹, Hyun Ook Seo, Dong Wun Kim, Kwang-Dae Kim, Yuan Luo, Dong Chan Lim, Hyungkuk Ju, Jin Won Kim, Jaeyoung Lee, Young Dok Kim

Affiliation

¹ Department of Chemistry, Kyungpook National University, 1370 Sankyuk-dong, Buk-gu, Daegu-city, 702-701, Republic of Korea.

PMID: 21475741
DOI: 10.1039/c1cc10307e

Abstract

Novel nanostructured gas filtering systems with TiO(2) thin films using atomic layer deposition (ALD) were developed for volatile organic compounds. A superior toluene adsorption efficiency was found for the nanostructured TiO(2) thin films.