General approach to reliable characterization of thin metal films

Tatiana V Amotchkina; Vesna Janicki; Jordi Sancho-Parramon; Alexander V Tikhonravov; Michael K Trubetskov; Hrvoje Zorc

doi:10.1364/AO.50.001453

General approach to reliable characterization of thin metal films

Appl Opt. 2011 Apr 1;50(10):1453-64. doi: 10.1364/AO.50.001453.

Authors

Tatiana V Amotchkina¹, Vesna Janicki, Jordi Sancho-Parramon, Alexander V Tikhonravov, Michael K Trubetskov, Hrvoje Zorc

Affiliation

¹ Research Computing Center, Moscow State University, Leninskie Gory, 119992, Moscow, Russia.

PMID: 21460914
DOI: 10.1364/AO.50.001453

Abstract

Optical constants of thin metal films are strongly dependent on deposition conditions, growth mode, and thickness. We propose a universal characterization approach that allows reliable determination of thin metal film optical constants as functions of wavelength and thickness. We apply this approach to determination of refractive index dispersion of silver island films embedded between silica layers.