Complementary metal-oxide semiconductor (CMOS) image sensor: an insight as a point-of-care label-free immunosensor

Anal Sci. 2010;26(12):1215-7. doi: 10.2116/analsci.26.1215.

Abstract

The present paper examines the efficiency of a complementary metal-oxide semiconductor (CMOS) using an indium nanoparticle (InNP) substrate for the high-sensitivity detection of antigen/antibody interactions at concentrations as low as 100 pg/ml under normal light. Metal NPs coated with antigen/antibody layers act as a dielectric layer on the conducting sphere, which enhances the number of photons hitting the sensor surface through a light-scattering effect. This photon number is proportional to the digital number observed with the CMOS sensor for detecting antigen/antibody interactions.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Antigen-Antibody Reactions*
  • Diagnostic Imaging / methods*
  • Humans
  • Immunologic Tests / instrumentation
  • Immunologic Tests / methods*
  • Indium
  • Limit of Detection
  • Metals
  • Nanoparticles
  • Oxides
  • Photons
  • Point-of-Care Systems*
  • Scattering, Radiation
  • Semiconductors*

Substances

  • Metals
  • Oxides
  • Indium