The Rh oxide ultrathin film on Rh(100): an x-ray photoelectron diffraction study

J Chem Phys. 2010 Dec 7;133(21):214701. doi: 10.1063/1.3509777.

Abstract

The surface and interface structure of the RhO(2) ultrathin film grown on Rh(100) is investigated by means of x-ray photoelectron diffraction. Experimental and simulated one- and two-dimensional angular distribution intensities of the O1s and Rh3d(5/2) chemically shifted core levels are quantitatively analyzed. The previously proposed O-Rh-O trilayer model is independently confirmed. A rippled buckling of the metal surface is observed at the oxide-metal interface, with a mean interfacial Rh-O distance which is 0.2 Å larger with respect to previous findings. The link between the local atomic rearrangement and the overall geometric and electronic properties of the oxide is discussed on the basis of a thorough comparison with the corresponding RhO(2) rutile structure.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Membranes, Artificial*
  • Models, Molecular
  • Oxides / chemistry*
  • Rhodium / chemistry*
  • Spectrophotometry
  • X-Ray Diffraction
  • X-Rays

Substances

  • Membranes, Artificial
  • Oxides
  • Rhodium