An interesting method to fabricate submicrometer gratings (SMGs) utilizing the interference of surface plasmon waves (SPWs) is presented. The stationary wave field off the aluminum (Al) layer surface of an Al-covered UV fiber core, formed by the interference of the induced SPWs, has been employed as a submicrometer photolithography tool to inscribe SMGs on the surface of a self-processing hybrid HfO(2)/SiO(2) solgel film. Using atomic force microscopy, the period of the fabricated SMGs was measured as 105 nm. The intensity distribution of the stationary wave field was measured by a near-field scanning optical microscope and anastomosed with theoretical values calculated by using FDTD simulations.