A new all-oxide design for broadband antireflection coatings with significantly reduced impact of deposition errors to the final reflectance is presented. Computational manufacturing including re-optimization during deposition has been used in the design work to account for maximum insensibility of the design with respect to deposition errors typical for plasma ion assisted deposition PIAD. Repeated deposition runs with the deducted monitoring and re-optimization strategy verify the validity of the simulations and the stability of the derived design solution.