High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation
Adv Mater
.
2010 Aug 24;22(32):3564-7.
doi: 10.1002/adma.201000766.
Authors
Paul Poodt
1
,
Adriaan Lankhorst
,
Fred Roozeboom
,
Karel Spee
,
Diederik Maas
,
Ad Vermeer
Affiliation
1
TNO Science & Industry, PO Box 6235, 5600 HE Eindhoven, The Netherlands. paul.poodt@tno.nl
PMID:
20665567
DOI:
10.1002/adma.201000766
No abstract available
MeSH terms
Aluminum Oxide / chemistry*
Electric Power Supplies
Silicon / chemistry
Solar Energy
Surface Properties
Substances
Aluminum Oxide
Silicon