The formation of MoO(3) sheets of nanoscale thickness is described. They are made from several fundamental sheets of orthorhombic alpha-MoO(3), which can be processed in large quantities via a low cost synthesis route that combines thermal evaporation and mechanical exfoliation. These fundamental sheets consist of double-layers of linked distorted MoO(6) octahedra. Atomic force microscopy (AFM) measurements show that the minimum resolvable thickness of these sheets is 1.4 nm which is equivalent to the thickness of two double-layers within one unit cell of the alpha-MoO(3) crystal.