Chemical mechanical planarization: slurry chemistry, materials, and mechanisms
Chem Rev
.
2010 Jan;110(1):178-204.
doi: 10.1021/cr900170z.
Authors
Mahadevaiyer Krishnan
1
,
Jakub W Nalaskowski
,
Lee M Cook
Affiliation
1
IBM T.J. Watson Research Center, Yorktown Heights, New York 10598, USA. krishnan@us.ibm.com
PMID:
19928828
DOI:
10.1021/cr900170z
No abstract available