Very large scale integration of nanopatterned YBa2Cu3O7-delta Josephson junctions in a two-dimensional array

Shane A Cybart; Steven M Anton; Stephen M Wu; John Clarke; Robert C Dynes

doi:10.1021/nl901785j

Very large scale integration of nanopatterned YBa2Cu3O7-delta Josephson junctions in a two-dimensional array

Nano Lett. 2009 Oct;9(10):3581-5. doi: 10.1021/nl901785j.

Authors

Shane A Cybart¹, Steven M Anton, Stephen M Wu, John Clarke, Robert C Dynes

Affiliation

¹ Department of Physics, University of California, Berkeley, California 94720, USA. scybart@berkeley.edu

PMID: 19751069
DOI: 10.1021/nl901785j

Abstract

Very large scale integration of Josephson junctions in a two-dimensional series-parallel array has been achieved by ion irradiating a YBa(2)Cu(3)O(7-delta) film through slits in a nanofabricated mask created with electron beam lithography and reactive ion etching. The mask consisted of 15820 high aspect ratio (20:1), 35 nm wide slits that restricted the irradiation in the film below to form Josephson junctions. Characterizing each parallel segment k, containing 28 junctions, with a single critical current I(ck) we found a standard deviation in I(ck) of about 16%.

Publication types

Research Support, U.S. Gov't, Non-P.H.S.