Reflective color filters using two-dimensional photonic crystals based on sub-wavelength gratings were proposed and constructed. Using low-cost nanoimprint lithography, an amorphous silicon layer was deposited through the low-temperature PECVD process and patterned into two-dimensional structures. The isolated amorphous silicon patterns were readily crystallized using a multi-shot excimer laser annealing at low energy. A study of the close relationship between color filter reflectance and silicon pattern crystallinity is introduced. Theoretical and experimental results show that the proposed color filters have high reflectance and, moreover, decrease the dependence on incident angle compared to one-dimensional photonic crystal color filters.