Field-enhanced metal-induced solid phase crystallization (FE-MISPC) of amorphous silicon is scaled down to nanoscale dimensions by using a sharp conductive tip in atomic force microscopy (AFM) as one of the electrodes. The room temperature process is driven by the electrical current of the order of 100 pA between the tip and the bottom nickel electrode. This results in energy transfer rates of 30-50 nJ s(-1). Amplitude of the current is limited by a MOSFET transistor to avoid electrical discharge from parasitic parallel capacitance. Limiting the current amplitude and control of the transferred energy (approximately 100 nJ) enables formation of silicon crystals with dimensions smaller than 100 nm in the amorphous film. Formation of the nanocrystals is localized by the AFM tip position. The presence of nanocrystals is detected by current-sensing AFM and independently corroborated by micro-Raman spectroscopy. The nanocrystal formation is discussed based on a model considering microscopic electrical contact, thermodynamics of crystallization and silicide formation.