Magnetolithography: from bottom-up route to high throughput
Small
.
2009 Mar;5(3):316-9.
doi: 10.1002/smll.200801058.
Authors
Amos Bardea
1
,
Ron Naaman
Affiliation
1
Department of Chemical Physics, The Weizmann Institute, Rehovot, Israel.
PMID:
19123174
DOI:
10.1002/smll.200801058
No abstract available
Publication types
Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.
MeSH terms
Magnetics*
Microscopy, Electron, Scanning
Nanoparticles / chemistry*
Particle Size