A compact portable vacuum-compatible chamber designed for surface X-ray scattering measurements on beamline ID01 of the European Synchrotron Radiation Facility, Grenoble, is described. The chamber is versatile and can be used for in situ investigation of various systems, such as surfaces, nanostructures, thin films etc., using a variety of X-ray-based techniques such as reflectivity, grazing-incidence small-angle scattering and diffraction. It has been conceived for the study of morphology and structure of semiconductor surfaces during ion beam erosion, but it is also used for the study of surface oxidation or thin film growth under ultra-high-vacuum conditions. Coherent X-ray beam experiments are also possible. The chamber is described in detail, and examples of its use are given.