By use of time and energy-resolved mass spectrometry, negative ions with masses ranging from m/z = 1-287 amu have been observed in the afterglow of a low-pressure (10 mTorr) pulsed acrylic acid polymerizing plasma. The most intense peaks, seen at m/z = 71, 143, 215, and 287, are assigned to the dehydrogenated oligomer of the form [nM-H](-) for n = 1, 2, 3, and 4, respectively. The results strongly suggest that both m/z = 71 and 143 ions are produced in the on period of the pulse cycle (0.1 ms duration), with higher masses m/z = 215 and 287 being produced by neutral ion chemistry in the off period (up to 40 ms in duration). The increase in the intensity of the [3M-H](-) and [4M-H](-) peaks in the off period is accompanied by a rapid fall in the concentration of [M-H]- ions and electrons, the latter decreasing from approximately 10(15) m(-3) to zero within 150 micros. Deep into the afterglow, Langmuir probe measurements show that the charge species only consist of positive and negative ions, present at equal concentrations in excess of approximately 10(14) m(-3) even after 10 ms that is, the plasma is wholly electron free. To describe the growth of large negative ions a number of possible ion-neutral chemical pathways have been postulated, and a calculation of the ambipolar diffusion rates to the walls suggests that, in the off period, the positive and negative ion contribution to the deposition rate is small ( approximately 1%) compared to the net total deposition rate. However, the observations do indicate that it may be necessary to update models of film growth in the pulsed plasma polymerization of acrylic acid to account for negative ions.