Switching transient analysis of a metal/ferroelectric/semiconductor switch diode with high speed response to infrared light

F Y Chen; J J Ho; Y K Fang; C Y Shu; C Y Hsu; J R Chen; M S Ju

doi:10.1109/58.764835

Switching transient analysis of a metal/ferroelectric/semiconductor switch diode with high speed response to infrared light

IEEE Trans Ultrason Ferroelectr Freq Control. 1999;46(3):502-10. doi: 10.1109/58.764835.

Authors

F Y Chen¹, J J Ho, Y K Fang, C Y Shu, C Y Hsu, J R Chen, M S Ju

Affiliation

¹ Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan, R.O.C.

PMID: 18238450
DOI: 10.1109/58.764835

Abstract

A thin PbTiO(3)-n-p(+) silicon switch diode has been developed, in which the switching voltage (the turned-on voltage) changes in proportion to the infrared light power. The diode has a rapid response time of 0.65 mus compared with other conventional infrared sensors. It is attributed to the rapid switching device structure and the smaller pyroelectric layer thickness, 50 nm. In this paper, we have analyzed the rapid switching transient response by using heat conduction and switching theory successfully. The experimental results are in agreement with the theoretical analysis.