Electron-beam chemical lithography with aliphatic self-assembled monolayers
Angew Chem Int Ed Engl
.
2008;47(8):1421-4.
doi: 10.1002/anie.200704105.
Authors
Nirmalya Ballav
1
,
Soeren Schilp
,
Michael Zharnikov
Affiliation
1
Angewandte Physikalische Chemie, Universität Heidelberg, 69120 Heidelberg, Germany.
PMID:
18188856
DOI:
10.1002/anie.200704105
No abstract available