A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements

Rev Sci Instrum. 2007 Oct;78(10):103901. doi: 10.1063/1.2793508.

Abstract

We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Electric Impedance
  • Electrochemistry / instrumentation*
  • Electrochemistry / methods
  • Equipment Design
  • Equipment Failure Analysis
  • Magnetics / instrumentation*
  • Materials Testing / instrumentation*
  • Materials Testing / methods
  • Membranes, Artificial*
  • Reproducibility of Results
  • Sensitivity and Specificity

Substances

  • Membranes, Artificial