New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications

S F Belykh; V V Palitsin; I V Veryovkin; A P Kovarsky; R J H Chang; A Adriaens; M G Dowsett; F Adams

doi:10.1063/1.2761021

New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications

Rev Sci Instrum. 2007 Aug;78(8):085101. doi: 10.1063/1.2761021.

Authors

S F Belykh¹, V V Palitsin, I V Veryovkin, A P Kovarsky, R J H Chang, A Adriaens, M G Dowsett, F Adams

Affiliation

¹ Department of Physics, University of Warwick, Warwick Conventry, UK.

PMID: 17764349
DOI: 10.1063/1.2761021

Abstract

A simple design for a cesium sputter ion source compatible with vacuum and ion-optical systems as well as with electronics of the commercially available Cameca IMS-4f instrument is reported. This ion source has been tested with the cluster primary ions of Si(n)(-) and Cu(n)(-). Our experiments with surface characterization and depth profiling conducted to date demonstrate improvements of the analytical capabilities of the secondary ion mass spectrometry instrument due to the nonadditive enhancement of secondary ion emission and shorter ion ranges of polyatomic projectiles compared to atomic ones with the same impact energy.

Publication types

Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

Cesium*
Computer-Aided Design*
Equipment Design
Equipment Failure Analysis
Heavy Ions*
Reproducibility of Results
Sensitivity and Specificity
Spectrometry, Mass, Electrospray Ionization / instrumentation*
Spectrometry, Mass, Electrospray Ionization / methods
Transducers*

Substances

Cesium