A new technique is proposed for the scanning and detection of nanoparticles on flat substrates and three-dimensional structures using fluorescence microscopy. This technique is utilized for particle removal measurements especially in semiconductor and hard disk manufacturing. This fluorescent particle scanning technique enables nanoscale particle detection. The technique shows that single particles down to 63 nm could be detected and counted. The technique is also capable of detecting particles in trenches that are as deep as 500 microm.
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