Electrical characterization of silicon tips using conducting atomic force microscopy

J Nanosci Nanotechnol. 2005 Aug;5(8):1277-80. doi: 10.1166/jnn.2005.207.

Abstract

The electrical properties of n-doped Si tips have been characterized in conducting atomic force microscopy under various conditions. Si tips with SiO2 layer on them present complex electric properties: which include a larger positive threshold bias, which is different from that of its doped semiconductor material. Silicon tips after removing their SiO2 layer had smaller positive threshold bias; such bias varied with the loading force: smaller loading forces corresponding to larger positive threshold biases, and it remained constant at lower levels for larger loading forces. Humidity of experiments influenced the threshold bias: lower relative humidities (<25%) and larger loading forces were in favor of getting stable threshold bias. The conductance increased remarkably in high relative humidity although it was kept in a narrow range when relative humidity was lower than 40%. Loading force didn't affect the conductance in the examined relative humidity conditions. One advantage of bare silicon tips over commercial conducting ones is that they smaller radius than gold-coated tips; this is in more favor of reaching single molecular electronics.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Electric Conductivity
  • Electrochemistry
  • Humidity
  • Microscopy, Atomic Force / instrumentation*
  • Nanotechnology
  • Silicon Dioxide
  • Silicon*

Substances

  • Silicon Dioxide
  • Silicon