Lithography with a focused soft X-ray beam and a monomolecular resist
Langmuir
.
2004 Mar 16;20(6):2050-3.
doi: 10.1021/la030398n.
Authors
Ruth Klauser
,
Mao-Lin Huang
,
Shih-Chieh Wang
,
Chia-Hao Chen
,
Tung Jung Chuang
,
Andreas Terfort
,
Michael Zharnikov
PMID:
15835648
DOI:
10.1021/la030398n
No abstract available
Publication types
Letter