Electrokinetic pumping of low-volume rates was performed on-chip in channels of small cross sectional area and height in the sub-microm range. The flow was detected with the current monitoring technique by monitoring the change in resistance of the fluid in the channel upon the electroosmosis-driven displacement of an electrolyte solution by a second electrolyte solution. Flow rates in the order of 0.1 pL/s were successfully generated and detected. The channels were fabricated with the sacrificial layer technology.