Fluorinated polymers form an interesting class of materials with a wealth of unique properties including self-assembly, remarkably low surface energies, low absorbance to 157 nm UV light, and solubility in supercritical carbon dioxide. As a result many fluorinated polymers are of use in advanced technology applications. We review some of our work on the synthesis and characterization of block copolymers with fluorinated side chains, with special emphasis on surfaces formed using these polymers. The use of fluorinated polymers as photoresists for 157 nm lithography, with the possibility for processing in environmentally friendly supercritical carbon dioxide is also discussed.
(c) 2004 The Japan Chemical Journal Forum and Wiley Periodicals, Inc.