Unprecedented insertion reaction of a silylene into a B-B bond and generation of a novel borylsilyl anion by boron-metal exchange reaction of the resultant diborylsilane

Takashi Kajiwara; Nobuhiro Takeda; Takahiro Sasamori; Norihiro Tokitoh

doi:10.1039/b409575h

Unprecedented insertion reaction of a silylene into a B-B bond and generation of a novel borylsilyl anion by boron-metal exchange reaction of the resultant diborylsilane

Chem Commun (Camb). 2004 Oct 7:(19):2218-9. doi: 10.1039/b409575h. Epub 2004 Aug 20.

Authors

Takashi Kajiwara¹, Nobuhiro Takeda, Takahiro Sasamori, Norihiro Tokitoh

Affiliation

¹ Institute for Chemical Research, Kyoto University, Gokasho, Uji, Kyoto 611-0011, Japan.

PMID: 15467880
DOI: 10.1039/b409575h

Abstract

A kinetically stabilized diarylsilylene, Tbt(Mes)Si: (1, Tbt = 2,4,6-tris[bis(trimethylsilyl)methyl]phenyl, Mes = mesityl), thermally generated from overcrowded disilene Tbt(Mes)Si=Si(Mes)Tbt (2) or stable silylene-isocyanide complex (3a), was found to insert into a B-B bond of bis(pinacolato)diboron, B2(pin)2 (4), and the boron-lithium exchange reaction of the resulting diborylsilane gave the first borylsilyl anion.