Selective deposition of polystyrene nanoparticles in a nanoetchpit array on a silicon substrate

Manabu Tanaka; Takumi Hosaka; Takashi Tanii; Iwao Ohdomari; Hiroyuki Nishide

doi:10.1039/b315816k

Selective deposition of polystyrene nanoparticles in a nanoetchpit array on a silicon substrate

Chem Commun (Camb). 2004 Apr 21:(8):978-9. doi: 10.1039/b315816k. Epub 2004 Mar 16.

Authors

Manabu Tanaka¹, Takumi Hosaka, Takashi Tanii, Iwao Ohdomari, Hiroyuki Nishide

Affiliation

¹ Department of Applied Chemistry, Waseda University, Tokyo 169-8555, Japan.

PMID: 15069503
DOI: 10.1039/b315816k

Abstract

Nanometer-sized polystyrene particles were selectively deposited by interfacial tension in nanometer-sized etchpit arrays made on a silicon substrate.