Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Chem Commun (Camb). 2004 Apr 7:(7):786-7. doi: 10.1039/b315278b. Epub 2004 Mar 5.

Abstract

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • DNA / chemistry*
  • Microscopy, Electron / methods*
  • Microscopy, Fluorescence
  • Nanostructures / chemistry*
  • Oligodeoxyribonucleotides / chemistry*
  • Organosilicon Compounds / chemistry
  • Silicon / chemistry*
  • Surface Properties

Substances

  • Oligodeoxyribonucleotides
  • Organosilicon Compounds
  • n-octadecyltrimethoxysilane
  • DNA
  • Silicon