In situ generation of the silica shell layer--key factor to the simple high yield synthesis of silver nanowires

Chih-Hao Hsia; Ming-Yu Yen; Chu-Chun Lin; Hsin-Tien Chiu; Chi-Young Lee

doi:10.1021/ja035339a

In situ generation of the silica shell layer--key factor to the simple high yield synthesis of silver nanowires

J Am Chem Soc. 2003 Aug 20;125(33):9940-1. doi: 10.1021/ja035339a.

Authors

Chih-Hao Hsia¹, Ming-Yu Yen, Chu-Chun Lin, Hsin-Tien Chiu, Chi-Young Lee

Affiliation

¹ Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan 30050, R.O.C.

PMID: 12914454
DOI: 10.1021/ja035339a

Abstract

a-Silica encapsulated silver nanowires (diameter of 25 +/- 5 nm, average length of 10 mum) have been synthesized by reacting (Me3Si)4Si with AgNO3 in nearly quantitative yield. Formation of the a-silica shell layer (1-3 nm) in situ appears to be one of the most important factors in this simple process.