High-reflectivity HfO2/SiO2 ultraviolet mirrors

Appl Opt. 2002 Jun 1;41(16):3256-61. doi: 10.1364/ao.41.003256.

Abstract

High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high-energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of approximately 99% near 250 nm are reported.