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Electrochemical Activation of Atomic-Layer-Deposited Nickel Oxide for Water Oxidation.
J Phys Chem C Nanomater Interfaces. 2023 Nov 8;127(46):22570-22582. doi: 10.1021/acs.jpcc.3c05002. eCollection 2023 Nov 23.
J Phys Chem C Nanomater Interfaces. 2023.
PMID: 38037639
Free PMC article.
Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors.
Beladiya V, Faraz T, Schmitt P, Munser AS, Schröder S, Riese S, Mühlig C, Schachtler D, Steger F, Botha R, Otto F, Fritz T, van Helvoirt C, Kessels WMM, Gargouri H, Szeghalmi A.
Beladiya V, et al. Among authors: van helvoirt c.
ACS Appl Mater Interfaces. 2022 Mar 30;14(12):14677-14692. doi: 10.1021/acsami.1c21889. Epub 2022 Mar 21.
ACS Appl Mater Interfaces. 2022.
PMID: 35311275
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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.
Faraz T, Knoops HCM, Verheijen MA, van Helvoirt CAA, Karwal S, Sharma A, Beladiya V, Szeghalmi A, Hausmann DM, Henri J, Creatore M, Kessels WMM.
Faraz T, et al. Among authors: van helvoirt caa.
ACS Appl Mater Interfaces. 2018 Apr 18;10(15):13158-13180. doi: 10.1021/acsami.8b00183. Epub 2018 Apr 9.
ACS Appl Mater Interfaces. 2018.
PMID: 29554799
Free PMC article.
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