Yeom GY - Search Results

1

Etch characteristics of Si and TiO₂ nanostructures using pulse biased inductively coupled plasmas.

Kim SG, Yang KC, Shin YJ, Kim KN, Kim DW, Lee JY, Kim Y, Yeom GY. Kim SG, et al. Among authors: yeom gy. Nanotechnology. 2020 Apr 9;31(26):265302. doi: 10.1088/1361-6528/ab7c75. Epub 2020 Mar 4. Nanotechnology. 2020. PMID: 32131063

2

Low damage atomic layer etching of ZrO2 by using BCl3 gas and ar neutral beam.

Lim WS, Park JB, Park JY, Park BJ, Yeom GY. Lim WS, et al. Among authors: yeom gy. J Nanosci Nanotechnol. 2009 Dec;9(12):7379-82. doi: 10.1166/jnn.2009.1748. J Nanosci Nanotechnol. 2009. PMID: 19908792

3

Effect of multi-polar magnetic field on the properties of nanocrystalline silicon thin film deposited by internal-type inductively coupled plasma.

Kim HB, Lee HC, Kim KN, Kang SK, Yeom GY. Kim HB, et al. Among authors: yeom gy. J Nanosci Nanotechnol. 2009 Dec;9(12):7440-5. doi: 10.1166/jnn.2009.1771. J Nanosci Nanotechnol. 2009. PMID: 19908805

4

Enhanced light extraction from GaN-based vertical light-emitting diodes with a nano-roughened N-GaN surface using dual-etch.

Kim TH, Kim KN, Seo JS, Kim KS, Bae JO, Yeom GY. Kim TH, et al. Among authors: yeom gy. J Nanosci Nanotechnol. 2013 Dec;13(12):8064-9. doi: 10.1166/jnn.2013.8188. J Nanosci Nanotechnol. 2013. PMID: 24266192

5

Controlled Layer-by-Layer Etching of MoS₂.

Lin T, Kang B, Jeon M, Huffman C, Jeon J, Lee S, Han W, Lee J, Lee S, Yeom G, Kim K. Lin T, et al. ACS Appl Mater Interfaces. 2015 Jul 29;7(29):15892-7. doi: 10.1021/acsami.5b03491. Epub 2015 Jul 14. ACS Appl Mater Interfaces. 2015. PMID: 26091282

6

Controlled MoS₂ layer etching using CF₄ plasma.

Jeon MH, Ahn C, Kim H, Kim KN, LiN TZ, Qin H, Kim Y, Lee S, Kim T, Yeom GY. Jeon MH, et al. Among authors: yeom gy. Nanotechnology. 2015 Sep 4;26(35):355706. doi: 10.1088/0957-4484/26/35/355706. Epub 2015 Aug 12. Nanotechnology. 2015. PMID: 26267409

7

Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beam.

Yun D, Park J, Kim H, Mun J, Kim S, Kim K, Yeom G. Yun D, et al. Nanotechnology. 2016 Sep 23;27(38):384002. doi: 10.1088/0957-4484/27/38/384002. Epub 2016 Aug 16. Nanotechnology. 2016. PMID: 27528588

8

Atomic layer etching of chrome using ion beams.

Park JW, Kim DS, Lee WO, Kim JE, Yeom GY. Park JW, et al. Among authors: yeom gy. Nanotechnology. 2019 Feb 22;30(8):085303. doi: 10.1088/1361-6528/aaf521. Epub 2018 Nov 30. Nanotechnology. 2019. PMID: 30523944

9

Efficient metallic nanowire welding using the Eddy current method.

Oh JS, Oh JS, Kim TH, Yeom GY. Oh JS, et al. Among authors: yeom gy. Nanotechnology. 2019 Feb 8;30(6):065708. doi: 10.1088/1361-6528/aaf13d. Nanotechnology. 2019. PMID: 30524023

10

Highly oxidation-resistant silver nanowires by C _x F _y polymers using plasma treatment.

Yang KC, Sung DI, Shin YJ, Yeom GY. Yang KC, et al. Among authors: yeom gy. Nanotechnology. 2019 Jul 12;30(28):285702. doi: 10.1088/1361-6528/ab114c. Epub 2019 Mar 20. Nanotechnology. 2019. PMID: 30893668

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