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Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
Makhotkin IA, Sobierajski R, Chalupský J, Tiedtke K, de Vries G, Störmer M, Scholze F, Siewert F, van de Kruijs RWE, Milov I, Louis E, Jacyna I, Jurek M, Klinger D, Nittler L, Syryanyy Y, Juha L, Hájková V, Vozda V, Burian T, Saksl K, Faatz B, Keitel B, Plönjes E, Schreiber S, Toleikis S, Loch R, Hermann M, Strobel S, Nienhuys HK, Gwalt G, Mey T, Enkisch H. Makhotkin IA, et al. Among authors: scholze f. J Synchrotron Radiat. 2018 Jan 1;25(Pt 1):77-84. doi: 10.1107/S1600577517017362. Epub 2018 Jan 1. J Synchrotron Radiat. 2018. PMID: 29271755 Free PMC article.
Refined extreme ultraviolet mask stack model.
Makhotkin IA, Wu M, Soltwisch V, Scholze F, Philipsen V. Makhotkin IA, et al. Among authors: scholze f. J Opt Soc Am A Opt Image Sci Vis. 2021 Apr 1;38(4):498-503. doi: 10.1364/JOSAA.416235. J Opt Soc Am A Opt Image Sci Vis. 2021. PMID: 33798178
Determination of optical constants of thin films in the EUV.
Ciesielski R, Saadeh Q, Philipsen V, Opsomer K, Soulié JP, Wu M, Naujok P, van de Kruijs RWE, Detavernier C, Kolbe M, Scholze F, Soltwisch V. Ciesielski R, et al. Among authors: scholze f. Appl Opt. 2022 Mar 10;61(8):2060-2078. doi: 10.1364/AO.447152. Appl Opt. 2022. PMID: 35297898
36 results