Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography.
Chevalier X, Pound-Lana G, Gomes Correia C, Cavalaglio S, Cabannes-Boué B, Restagno F, Miquelard-Garnier G, Roland S, Navarro C, Fleury G, Zelsmann M.
Chevalier X, et al. Among authors: roland s.
Nanotechnology. 2023 Feb 13;34(17). doi: 10.1088/1361-6528/acb49f.
Nanotechnology. 2023.
PMID: 36657158