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Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors.
Beladiya V, Faraz T, Schmitt P, Munser AS, Schröder S, Riese S, Mühlig C, Schachtler D, Steger F, Botha R, Otto F, Fritz T, van Helvoirt C, Kessels WMM, Gargouri H, Szeghalmi A. Beladiya V, et al. Among authors: otto f. ACS Appl Mater Interfaces. 2022 Mar 30;14(12):14677-14692. doi: 10.1021/acsami.1c21889. Epub 2022 Mar 21. ACS Appl Mater Interfaces. 2022. PMID: 35311275
Influence of Film and Substrate Structure on Photoelectron Momentum Maps of Coronene Thin Films on Ag(111).
Udhardt C, Otto F, Kern C, Lüftner D, Huempfner T, Kirchhuebel T, Sojka F, Meissner M, Schröter B, Forker R, Puschnig P, Fritz T. Udhardt C, et al. Among authors: otto f. J Phys Chem C Nanomater Interfaces. 2017 Jun 8;121(22):12285-12293. doi: 10.1021/acs.jpcc.7b03500. Epub 2017 May 11. J Phys Chem C Nanomater Interfaces. 2017. PMID: 28620448 Free PMC article.
Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study.
Beladiya V , Becker M , Faraz T , Kessels WMME , Schenk P , Otto F , Fritz T , Gruenewald M , Helbing C , Jandt KD , Tünnermann A , Sierka M , Szeghalmi A . Beladiya V , et al. Among authors: otto f. Nanoscale. 2020 Jan 23;12(3):2089-2102. doi: 10.1039/c9nr07202k. Nanoscale. 2020. PMID: 31912855
Atomically Thin Metal-Dielectric Heterostructures by Atomic Layer Deposition.
Paul P, Schmitt P, Sigurjónsdóttir VV, Hanemann K, Felde N, Schröder S, Otto F, Gruenewald M, Fritz T, Roddatis V, Tünnermann A, Szeghalmi A. Paul P, et al. Among authors: otto f. ACS Appl Mater Interfaces. 2023 May 10;15(18):22626-22636. doi: 10.1021/acsami.2c22590. Epub 2023 Apr 25. ACS Appl Mater Interfaces. 2023. PMID: 37097287
275 results