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Reconfigurable silicon nanowire transistors.
Heinzig A, Slesazeck S, Kreupl F, Mikolajick T, Weber WM. Heinzig A, et al. Among authors: mikolajick t. Nano Lett. 2012 Jan 11;12(1):119-24. doi: 10.1021/nl203094h. Epub 2011 Dec 1. Nano Lett. 2012. PMID: 22111808
Ferroelectricity in Si-doped HfO2 revealed: a binary lead-free ferroelectric.
Martin D, Müller J, Schenk T, Arruda TM, Kumar A, Strelcov E, Yurchuk E, Müller S, Pohl D, Schröder U, Kalinin SV, Mikolajick T. Martin D, et al. Among authors: mikolajick t. Adv Mater. 2014 Dec 23;26(48):8198-202. doi: 10.1002/adma.201403115. Epub 2014 Oct 28. Adv Mater. 2014. PMID: 25352107
Ferroelectricity and antiferroelectricity of doped thin HfO2-based films.
Park MH, Lee YH, Kim HJ, Kim YJ, Moon T, Kim KD, Müller J, Kersch A, Schroeder U, Mikolajick T, Hwang CS. Park MH, et al. Among authors: mikolajick t. Adv Mater. 2015 Mar 18;27(11):1811-31. doi: 10.1002/adma.201404531. Epub 2015 Feb 11. Adv Mater. 2015. PMID: 25677113
Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors.
Mulaosmanovic H, Ocker J, Müller S, Schroeder U, Müller J, Polakowski P, Flachowsky S, van Bentum R, Mikolajick T, Slesazeck S. Mulaosmanovic H, et al. Among authors: mikolajick t. ACS Appl Mater Interfaces. 2017 Feb 1;9(4):3792-3798. doi: 10.1021/acsami.6b13866. Epub 2017 Jan 24. ACS Appl Mater Interfaces. 2017. PMID: 28071052
Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material.
Schroeder U, Richter C, Park MH, Schenk T, Pešić M, Hoffmann M, Fengler FPG, Pohl D, Rellinghaus B, Zhou C, Chung CC, Jones JL, Mikolajick T. Schroeder U, et al. Among authors: mikolajick t. Inorg Chem. 2018 Mar 5;57(5):2752-2765. doi: 10.1021/acs.inorgchem.7b03149. Epub 2018 Feb 15. Inorg Chem. 2018. PMID: 29446630
63 results