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In Situ-Doped Silicon Thin Films for Passivating Contacts by Hot-Wire Chemical Vapor Deposition with a High Deposition Rate of 42 nm/min.
ACS Appl Mater Interfaces. 2019 Aug 21;11(33):30493-30499. doi: 10.1021/acsami.9b10360. Epub 2019 Aug 12.
ACS Appl Mater Interfaces. 2019.
PMID: 31361110
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