A new method for evaluating postacne scarring.
Lee JW, Kim BJ, Kim MN, Choi YH, Kim K, Hwang E.
Lee JW, et al. Among authors: kim mn, kim bj, kim k.
Skin Res Technol. 2012 Aug;18(3):384-5. doi: 10.1111/j.1600-0846.2011.00568.x. Epub 2011 Aug 25.
Skin Res Technol. 2012.
PMID: 22092451
No abstract available.