Atomic-layer soft plasma etching of MoS2.
Xiao S, Xiao P, Zhang X, Yan D, Gu X, Qin F, Ni Z, Han ZJ, Ostrikov KK.
Xiao S, et al. Among authors: gu x.
Sci Rep. 2016 Jan 27;6:19945. doi: 10.1038/srep19945.
Sci Rep. 2016.
PMID: 26813335
Free PMC article.