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Cluster secondary ion emission of silicon: An influence of the samples' dimensional features.
Rapid Commun Mass Spectrom. 2019 Feb 15;33(3):323-325. doi: 10.1002/rcm.8345.
Rapid Commun Mass Spectrom. 2019.
PMID: 30408251
No abstract available.
Sputtering of silicon nanopowders by an argon cluster ion beam.
Zeng X, Pelenovich V, Wang Z, Zuo W, Belykh S, Tolstogouzov A, Fu D, Xiao X.
Zeng X, et al.
Beilstein J Nanotechnol. 2019 Jan 10;10:135-143. doi: 10.3762/bjnano.10.13. eCollection 2019.
Beilstein J Nanotechnol. 2019.
PMID: 30680286
Free PMC article.
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New Cs sputter ion source with polyatomic ion beams for secondary ion mass spectrometry applications.
Belykh SF, Palitsin VV, Veryovkin IV, Kovarsky AP, Chang RJ, Adriaens A, Dowsett MG, Adams F.
Belykh SF, et al.
Rev Sci Instrum. 2007 Aug;78(8):085101. doi: 10.1063/1.2761021.
Rev Sci Instrum. 2007.
PMID: 17764349
Free article.
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