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A Novel Source/Drain Extension Scheme with Laser-Spike Annealing for Nanosheet Field-Effect Transistors in 3D ICs.
Nanomaterials (Basel). 2023 Feb 26;13(5):868. doi: 10.3390/nano13050868.
Nanomaterials (Basel). 2023.
PMID: 36903745
Free PMC article.
Demonstration of p-type stack-channel ternary logic device using scalable DNTT patterning process.
Lee Y, Kwon H, Kim SM, Lee HI, Kim K, Lee HW, Kim SY, Hwang HJ, Lee BH.
Lee Y, et al.
Nano Converg. 2023 Mar 9;10(1):12. doi: 10.1186/s40580-023-00362-w.
Nano Converg. 2023.
PMID: 36894801
Free PMC article.
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