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Interface Optimization and Performance Enhancement of Er2O3-Based MOS Devices by ALD-Derived Al2O3 Passivation Layers and Annealing Treatment.
Nanomaterials (Basel). 2023 May 26;13(11):1740. doi: 10.3390/nano13111740.
Nanomaterials (Basel). 2023.
PMID: 37299643
Free PMC article.
Interface Optimization and Transport Modulation of Sm2O3/InP Metal Oxide Semiconductor Capacitors with Atomic Layer Deposition-Derived Laminated Interlayer.
Lu J, He G, Yan J, Dai Z, Zheng G, Jiang S, Qiao L, Gao Q, Fang Z.
Lu J, et al.
Nanomaterials (Basel). 2021 Dec 19;11(12):3443. doi: 10.3390/nano11123443.
Nanomaterials (Basel). 2021.
PMID: 34947792
Free PMC article.
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