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Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and Ozone.
Nanoscale Res Lett. 2019 May 7;14(1):154. doi: 10.1186/s11671-019-2989-8.
Nanoscale Res Lett. 2019.
PMID: 31065821
Free PMC article.
Effect of Composition, Interface, and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer Deposition.
Li J, Wu J, Liu J, Sun J.
Li J, et al.
Nanoscale Res Lett. 2019 Mar 4;14(1):75. doi: 10.1186/s11671-019-2907-0.
Nanoscale Res Lett. 2019.
PMID: 30830448
Free PMC article.
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Blue Electroluminescent Al₂O₃/Tm₂O₃ Nanolaminate Films Fabricated by Atomic Layer Deposition on Silicon.
Liu Y, Ouyang Z, Yang L, Yang Y, Sun J.
Liu Y, et al.
Nanomaterials (Basel). 2019 Mar 11;9(3):413. doi: 10.3390/nano9030413.
Nanomaterials (Basel). 2019.
PMID: 30862053
Free PMC article.
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